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        當前位置:首頁 > 產品與服務> 圖形化襯底

        圖形化襯底DPSS

        2014-09-02

        2"DPSS

        Inspection

        Item

        Detail

        Spec

        Description

        SEM
        Image
        Inspection

        Width

        Average

        2.70±0.15um

        Flat-top shaped pattern not allowed

        Unif.

        5%

        Height

        Average

        1.65±0.15um

        Unif.

        5%

        Scope Inspection

        Particle

        50um*

        100ea

        No visible particle on wafer
        The total lens should be less than 3mm

        [50um,250um]*

        30ea

        [250um,500um]*

        20ea

        [500um,1500um]*

        10ea

        1500um*

        0

        Pattern Missing

        50um*

        80ea

        The total length shoud be less than 2mm

        [50um,250um]*

        30ea

        [250um,500um]*

        15ea

        [500um,1500um]*

        8ea

        1500um*

        0

        Pattern Fail

        50um*

        80ea

        [50um,250um]*

        30ea

        [250um,500um]*

        15ea

        [500um,1500um]*

        8ea

        1500um*

        0

        Scratch

        1.2mm

        7ea

        width60um and lenth1.2mm should be judged as 1ea
        if the pattern link happenes in the nearest 20 patternes area from the scratch,the pattern link should not be counted

        Edge Bead

        Edge Bead

        1.8mm

        The pattern failed within the 1.8mm area from the wafer edge should not be counted
        The non-pattern area should be less than1mm from the wafer edge

        Abnormal Shape

        Abnormal Shape

        3%

        Total area of abormal shape pattern should be less than 3%

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